JPS6217876B2 - - Google Patents

Info

Publication number
JPS6217876B2
JPS6217876B2 JP55029972A JP2997280A JPS6217876B2 JP S6217876 B2 JPS6217876 B2 JP S6217876B2 JP 55029972 A JP55029972 A JP 55029972A JP 2997280 A JP2997280 A JP 2997280A JP S6217876 B2 JPS6217876 B2 JP S6217876B2
Authority
JP
Japan
Prior art keywords
series
transistor
impurity regions
gate electrode
mis transistors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55029972A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56125854A (en
Inventor
Koji Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP2997280A priority Critical patent/JPS56125854A/ja
Priority to GB8107353A priority patent/GB2074372B/en
Publication of JPS56125854A publication Critical patent/JPS56125854A/ja
Priority to GB08329900A priority patent/GB2135549B/en
Priority to US06/661,837 priority patent/US4635088A/en
Publication of JPS6217876B2 publication Critical patent/JPS6217876B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/01—Modifications for accelerating switching
    • H03K19/017—Modifications for accelerating switching in field-effect transistor circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
    • H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
    • H03K19/0944—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
    • H03K19/09441—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Power Engineering (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2997280A 1980-03-10 1980-03-10 Integrated circuit Granted JPS56125854A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2997280A JPS56125854A (en) 1980-03-10 1980-03-10 Integrated circuit
GB8107353A GB2074372B (en) 1980-03-10 1981-03-09 Integrated circuit field effect transistors
GB08329900A GB2135549B (en) 1980-03-10 1983-11-09 Semiconductor integrated circuits
US06/661,837 US4635088A (en) 1980-03-10 1984-10-17 High speed-low power consuming IGFET integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2997280A JPS56125854A (en) 1980-03-10 1980-03-10 Integrated circuit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1189217A Division JPH02290056A (ja) 1989-07-21 1989-07-21 集積回路

Publications (2)

Publication Number Publication Date
JPS56125854A JPS56125854A (en) 1981-10-02
JPS6217876B2 true JPS6217876B2 (en]) 1987-04-20

Family

ID=12290870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2997280A Granted JPS56125854A (en) 1980-03-10 1980-03-10 Integrated circuit

Country Status (3)

Country Link
US (1) US4635088A (en])
JP (1) JPS56125854A (en])
GB (1) GB2074372B (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134685U (en]) * 1987-02-24 1988-09-02
JPS6422270U (en]) * 1987-08-03 1989-02-06

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0101896B1 (en) * 1982-07-30 1988-05-18 Kabushiki Kaisha Toshiba Mos logic circuit
US4721986A (en) * 1984-02-21 1988-01-26 International Rectifier Corporation Bidirectional output semiconductor field effect transistor and method for its maufacture
JPH0638477B2 (ja) * 1986-09-19 1994-05-18 富士通株式会社 半導体集積回路
JPH084129B2 (ja) * 1986-11-19 1996-01-17 キヤノン株式会社 光電変換装置
JPH0745961Y2 (ja) * 1987-03-19 1995-10-18 三洋電機株式会社 バスラインドライバ
GB2224160A (en) * 1988-10-24 1990-04-25 Marconi Instruments Ltd Integrated semiconductor circuits
US5272369A (en) * 1990-03-28 1993-12-21 Interuniversitair Micro-Elektronica Centrum Vzw Circuit element with elimination of kink effect
GB9201004D0 (en) * 1992-01-17 1992-03-11 Philips Electronic Associated A semiconductor device comprising an insulated gate field effect device
JP2758531B2 (ja) * 1992-04-22 1998-05-28 三菱電機株式会社 半導体装置
JP2757848B2 (ja) * 1996-01-23 1998-05-25 日本電気株式会社 電界効果型半導体装置
US6160280A (en) * 1996-03-04 2000-12-12 Motorola, Inc. Field effect transistor
JP3119177B2 (ja) * 1996-10-24 2000-12-18 日本電気株式会社 半導体装置
US6090650A (en) * 1997-09-30 2000-07-18 Intel Corporation Method to reduce timing skews in I/O circuits and clock drivers caused by fabrication process tolerances
JP2001352047A (ja) * 2000-06-05 2001-12-21 Oki Micro Design Co Ltd 半導体集積回路
EP1508919A1 (en) * 2003-08-22 2005-02-23 Dialog Semiconductor GmbH Cascaded transistors in one well
JP4024762B2 (ja) * 2004-01-16 2007-12-19 ユーディナデバイス株式会社 高周波スイッチ
JP5372578B2 (ja) * 2009-04-09 2013-12-18 ルネサスエレクトロニクス株式会社 半導体装置
JP2012054502A (ja) * 2010-09-03 2012-03-15 Elpida Memory Inc 半導体装置
CN104967439B (zh) * 2015-07-01 2018-02-06 东南大学 氮化镓基低漏电流固支梁开关场效应晶体管或非门

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3660697A (en) * 1970-02-16 1972-05-02 Bell Telephone Labor Inc Monolithic semiconductor apparatus adapted for sequential charge transfer
JPS5431671B2 (en]) * 1973-03-14 1979-10-08
US3967988A (en) * 1974-08-05 1976-07-06 Motorola, Inc. Diffusion guarded metal-oxide-silicon field effect transistors
JPS5181580A (en]) * 1975-01-16 1976-07-16 Hitachi Ltd
JPS5198938A (en]) * 1975-02-26 1976-08-31
JPS5851427B2 (ja) * 1975-09-04 1983-11-16 株式会社日立製作所 絶縁ゲ−ト型リ−ド・オンリ−・メモリの製造方法
JPS5258452A (en) * 1975-11-10 1977-05-13 Hitachi Ltd Mis logic circuit
US4084173A (en) * 1976-07-23 1978-04-11 Texas Instruments Incorporated Interdigitated transistor pair
JPS5333072A (en) * 1976-09-09 1978-03-28 Nec Corp Semiconductor device
US4142197A (en) * 1977-04-14 1979-02-27 Rca Corp. Drain extensions for closed COS/MOS logic devices
JPS5487159A (en) * 1977-12-23 1979-07-11 Fujitsu Ltd Exclusive logical sum circuit
JPS5925381B2 (ja) * 1977-12-30 1984-06-16 富士通株式会社 半導体集積回路装置
US4389582A (en) * 1979-02-09 1983-06-21 Tokyo Shibaura Denki Kabushiki Kaisha MOS Integrated logic circuit device with improved switching speed characteristics
JPS6038028B2 (ja) * 1979-07-23 1985-08-29 三菱電機株式会社 基板電位発生装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134685U (en]) * 1987-02-24 1988-09-02
JPS6422270U (en]) * 1987-08-03 1989-02-06

Also Published As

Publication number Publication date
GB2074372A (en) 1981-10-28
JPS56125854A (en) 1981-10-02
GB2074372B (en) 1984-09-26
US4635088A (en) 1987-01-06

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